Herbas VPB

Print
EN | LT
LT - Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films
EN - Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films

Legal status

Patent not validated

Bibliographic data
Indications of the International Patent Classification (IPC)
(51) INT.CL. C09K 3/14
C09G 1/02
H01L 21/3105
C09K 13/00
European patent
(11) Number of the document 2428541
(13) Kind of document T
(96) European patent application number 11179985.4
Date of filing the European patent application 2011-09-05
(97) Date of publication of the European application 2012-03-14
(45) Date of publication and mention of the grant of the patent 2019-03-06
(46) Date of publication of the claims translation
Priority applications
(30) Number Date Country code
380719 P 2010-09-08 US
Inventors
(72)
Li, Yuzhuo, DE
Chu, Jea-Ju, TW
Venkataraman, Shyam Sundar, TW
Chiu, Wei Lan William, TW
Pinder, Harvey Wayne, US
Grantee
(73) BASF SE, Carl-Bosch-Strasse 38, 67056 Ludwigshafen am Rhein, DE
Title
(54) Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films
  Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films