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LT - POSITIVE-TYPE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS

EN - POSITIVE-TYPE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS

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Bibliographic data

Indications of the International Patent Classification (IPC)
(51)	INT.CL.	G03F 7/004
		G02B 3/00
		G03F 7/023
		G03F 7/022

European patent
(11)	Number of the document	2530524
(13)	Kind of document	T
(96)	European patent application number	11736902.5
	Date of filing the European patent application	2011-01-19
(97)	Date of publication of the European application	2012-12-05
(45)	Date of publication and mention of the grant of the patent	2019-05-29
(46)	Date of publication of the claims translation

PCT application
(86)	Number	PCT/JP2011/050854
	Date	2011-01-19

PCT application publication
(87)	Number	WO 2011/093188
	Date	2011-08-04

Priority applications
(30)	Number	Date	Country code
	2010014505	2010-01-26	JP

Inventors
(72)	YUKAWA, Shojiro, JP ARASE, Shinya, JP TAKEYAMA, Toshiaki, JP ENDO, Yuki, JP MORO, Takeo, JP

Grantee
(73)	Nissan Chemical Corporation, 5-1, Nihonbashi 2-chome Chuo-ku, Tokyo, JP

Title
(54)	POSITIVE-TYPE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS
	POSITIVE-TYPE RESIST COMPOSITION AND METHOD FOR PRODUCING MICROLENS