LT - CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND
EN - CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND
Legal status
Patent not validated
Bibliographic data
Indications of the International Patent Classification (IPC)
| (51) |
INT.CL. |
G03F 7/038 |
(2006.01) |
|
|
C08F 12/24 |
(2006.01) |
|
|
G03F 7/039 |
(2006.01) |
European patent
| (11) |
Number of the document |
2666057 |
| (13) |
Kind of document |
T |
| (96) |
European patent application number |
11856421.0 |
|
Date of filing the European patent application |
2011-12-22 |
| (97) |
Date of publication of the European application |
2013-11-27 |
| (45) |
Date of publication and mention of the grant of the patent |
2021-07-28
|
| (46) |
Date of publication of the claims translation |
|
PCT application
| (86) |
Number |
PCT/JP2011/080549 |
|
Date |
2011-12-22 |
PCT application publication
| (87) |
Number |
WO 2012/098822 |
|
Date |
2012-07-26 |
Priority applications
| (30) |
Number |
Date |
Country code |
|
2011008331 |
2011-01-18
|
JP |
|
201161504431 P |
2011-07-05
|
US |
|
2011255302 |
2011-11-22
|
JP |
Inventors
| (72) |
TSUCHIMURA, Tomotaka , JP
YATSUO, Tadateru , JP
|
Grantee
| (73) |
FUJIFILM Corporation ,
26-30, Nishiazabu 2-chome
Minato-ku, Tokyo 106-8620,
JP
|
Title
| (54) |
CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND |
| |
CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM USING THE COMPOSITION, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, PHOTOMASK AND POLYMER COMPOUND |
