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Legal status
Patent not validated
| (51) | INT.CL. | G03F 7/038 | |
| G03F 7/004 | |||
| G03F 7/039 | |||
| G03F 7/32 | |||
| G03F 7/11 | |||
| G03F 7/20 | |||
| G03F 7/40 |
| (11) | Number of the document | 2681623 |
| (13) | Kind of document | T |
| (96) | European patent application number | 12752967.5 |
| Date of filing the European patent application | 2012-02-24 | |
| (97) | Date of publication of the European application | 2014-01-08 |
| (45) | Date of publication and mention of the grant of the patent | 2019-07-10 |
| (46) | Date of publication of the claims translation |
| (86) | Number | PCT/JP2012/055298 |
| Date | 2012-02-24 |
| (87) | Number | WO 2012/118168 |
| Date | 2012-09-07 |
| (30) | Number | Date | Country code |
| 2011043321 | 2011-02-28 | JP | |
| 201161447258 P | 2011-02-28 | US | |
| 2011177257 | 2011-08-12 | JP | |
| 2012035633 | 2012-02-21 | JP |
| (72) |
TAKAHASHI, Hidenori, JP
YAMAGUCHI, Shuhei, JP
KATAOKA, Shohei, JP
SHIRAKAWA, Michihiro, JP
YOSHINO, Fumihiro, JP
SAITOH, Shoichi, JP
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| (73) |
FUJIFILM Corporation,
26-30, Nishiazabu 2-chome Minato-ku, Tokyo 106-0031,
JP
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| (54) | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM |
| PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM |