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Teisinis statusas
Patentas neįsigaliojo (pagal EPK)
| (51) | INT.CL. | G03F 7/038 | (2006.01) |
| G03F 7/2024 | (2013.01) | ||
| G03F 7/004 | (2006.01) | ||
| G03F 7/095 | (2013.01) | ||
| G03F 7/36 | (2006.01) | ||
| G03F 7/033 | (2013.01) | ||
| G03F 7/38 | (2006.01) | ||
| G03F 7/0382 | (2013.01) | ||
| G03F 7/40 | (2006.01) | ||
| G03F 7/2022 | (2013.01) | ||
| G03F 7/20 | (2006.01) | ||
| G03F 7/027 | (2013.01) | ||
| G03F 7/027 | (2006.01) |
| (11) | Patento numeris | 3511774 |
| (13) | Dokumento rūšis | T |
| (96) | Europos patento paraiškos numeris | 19158497.8 |
| Europos patento paraiškos padavimo data | 2016-12-20 | |
| (97) | Europos patento paraiškos paskelbimo data | 2019-07-17 |
| (45) | Paskelbimo apie Europos patento išdavimą data | 2021-10-27 |
| (46) | Apibrėžties vertimo paskelbimo data |
| (30) | Numeris | Data | Šalis |
| 201514976498 | 2015-12-21 | US |
| (72) |
Chen, Chunwei , US
Liu, Weihong , US
Lu, PingHung , US
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| (73) |
Merck Patent GmbH ,
Frankfurter Strasse 250, 64293 Darmstadt,
DE
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| (54) | NEGATIVE-WORKING PHOTORESIST COMPOSITION FOR LASER ABLATION AND PROCESS USING IT |
| NEGATIVE-WORKING PHOTORESIST COMPOSITION FOR LASER ABLATION AND PROCESS USING IT |