LT - PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, METHOD FOR PATTERN FORMATION, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
EN - PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, METHOD FOR PATTERN FORMATION, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
Legal status
Patent not validated
Bibliographic data
Indications of the International Patent Classification (IPC)
| (51) |
INT.CL. |
C08F 220/16 |
(2006.01) |
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C08F 212/24 |
(2020.02) |
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C08F 220/22 |
(2006.01) |
|
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G03F 7/0045 |
(2013.01) |
|
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G03F 7/039 |
(2006.01) |
|
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G03F 7/0046 |
(2013.01) |
|
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G03F 7/20 |
(2006.01) |
|
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G03F 7/0392 |
(2013.01) |
|
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C08F 220/18 |
(2006.01) |
|
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G03F 7/0397 |
(2013.01) |
|
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C08F 220/24 |
(2006.01) |
|
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C08F 220/1806 |
(2020.02) |
|
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C08F 220/28 |
(2006.01) |
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C08F 220/1807 |
(2020.02) |
|
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G03F 7/004 |
(2006.01) |
|
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C08F 220/24 |
(2013.01) |
|
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C08L 33/12 |
(2006.01) |
|
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C08F 220/283 |
(2020.02) |
|
|
C08L 33/12 |
(2013.01) |
European patent
| (11) |
Number of the document |
3950744 |
| (13) |
Kind of document |
T |
| (96) |
European patent application number |
20784526.4 |
|
Date of filing the European patent application |
2020-03-09 |
| (97) |
Date of publication of the European application |
2022-02-09 |
| (45) |
Date of publication and mention of the grant of the patent |
2023-10-18
|
| (46) |
Date of publication of the claims translation |
|
PCT application
| (86) |
Number |
PCT/JP2020/010050 |
|
Date |
2020-03-09 |
PCT application publication
| (87) |
Number |
WO 2020/203073 |
|
Date |
2020-10-08 |
Priority applications
| (30) |
Number |
Date |
Country code |
|
2019067401 |
2019-03-29
|
JP |
|
2020030660 |
2020-02-26
|
JP |
Inventors
| (72) |
SAKITA, Kyohei , JP
|
Grantee
| (73) |
FUJIFILM Corporation ,
26-30, Nishiazabu 2-chome
Minato-ku, Tokyo 106-8620,
JP
|
Title
| (54) |
PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, METHOD FOR PATTERN FORMATION, AND METHOD FOR PRODUCING ELECTRONIC DEVICE |
| |
PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, METHOD FOR PATTERN FORMATION, AND METHOD FOR PRODUCING ELECTRONIC DEVICE |
