LT - Exposure apparatus, exposure method and device manufacturing method
EN - Exposure apparatus, exposure method and device manufacturing method
Legal status
Patent not validated
Bibliographic data
Indications of the International Patent Classification (IPC)
| (51) |
INT.CL. |
H01L 21/027 |
|
|
|
G03F 7/20 |
|
European patent
| (11) |
Number of the document |
2287893 |
| (13) |
Kind of document |
T |
| (96) |
European patent application number |
10186140.9 |
|
Date of filing the European patent application |
2005-01-27 |
| (97) |
Date of publication of the European application |
2011-02-23 |
| (45) |
Date of publication and mention of the grant of the patent |
2016-04-20
|
| (46) |
Date of publication of the claims translation |
|
Priority applications
| (30) |
Number |
Date |
Country code |
|
2004025837 |
2004-02-02
|
JP |
|
2004300566 |
2004-10-14
|
JP |
Inventors
| (72) |
Shibazaki, Yuichi, JP
|
Grantee
| (73) |
Nikon Corporation,
15-3, Konan 2-chome Minato-ku, Tokyo 108-6290,
JP
|
Title
| (54) |
Exposure apparatus, exposure method and device manufacturing method |
| |
Exposure apparatus, exposure method and device manufacturing method |
