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LT - SPUTTERING TARGET AND/OR COIL AND PROCESS FOR PRODUCING SAME

EN - SPUTTERING TARGET AND/OR COIL AND PROCESS FOR PRODUCING SAME

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Patent not validated

Bibliographic data

Indications of the International Patent Classification (IPC)
(51)	INT.CL.	C21D 1/74
		C23C 14/34
		H01J 37/34
		C21D 3/06
		C22C 14/00
		C22C 27/02
		C22F 1/00
		C22F 1/18

European patent
(11)	Number of the document	2599892
(13)	Kind of document	T
(96)	European patent application number	11812510.3
	Date of filing the European patent application	2011-07-27
(97)	Date of publication of the European application	2013-06-05
(45)	Date of publication and mention of the grant of the patent	2020-10-14
(46)	Date of publication of the claims translation

PCT application
(86)	Number	PCT/JP2011/067061
	Date	2011-07-27

PCT application publication
(87)	Number	WO 2012/014921
	Date	2012-02-02

Priority applications
(30)	Number	Date	Country code
	2010172408	2010-07-30	JP

Inventors
(72)	NAGATA Kenichi, JP MAKINO Nobuhito, JP

Grantee
(73)	JX Nippon Mining & Metals Corporation, 10-4, Toranomon 2-chome Minato-ku, Tokyo 105-8417, JP

Title
(54)	SPUTTERING TARGET AND/OR COIL AND PROCESS FOR PRODUCING SAME
	SPUTTERING TARGET AND/OR COIL AND PROCESS FOR PRODUCING SAME