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Teisinis statusas
Patentas neįsigaliojo (pagal EPK)
| (51) | INT.CL. | C21D 1/74 | |
| C23C 14/34 | |||
| H01J 37/34 | |||
| C21D 3/06 | |||
| C22C 14/00 | |||
| C22C 27/02 | |||
| C22F 1/00 | |||
| C22F 1/18 |
| (11) | Patento numeris | 2599892 |
| (13) | Dokumento rūšis | T |
| (96) | Europos patento paraiškos numeris | 11812510.3 |
| Europos patento paraiškos padavimo data | 2011-07-27 | |
| (97) | Europos patento paraiškos paskelbimo data | 2013-06-05 |
| (45) | Paskelbimo apie Europos patento išdavimą data | 2020-10-14 |
| (46) | Apibrėžties vertimo paskelbimo data |
| (86) | Numeris | PCT/JP2011/067061 |
| Data | 2011-07-27 |
| (87) | Numeris | WO 2012/014921 |
| Data | 2012-02-02 |
| (30) | Numeris | Data | Šalis |
| 2010172408 | 2010-07-30 | JP |
| (72) |
NAGATA Kenichi, JP
MAKINO Nobuhito, JP
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| (73) |
JX Nippon Mining & Metals Corporation,
10-4, Toranomon 2-chome Minato-ku, Tokyo 105-8417,
JP
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| (54) | SPUTTERING TARGET AND/OR COIL AND PROCESS FOR PRODUCING SAME |
| SPUTTERING TARGET AND/OR COIL AND PROCESS FOR PRODUCING SAME |