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LT - TANTALUM SPUTTERING TARGET AND METHOD FOR PRODUCING SAME

EN - TANTALUM SPUTTERING TARGET AND METHOD FOR PRODUCING SAME

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Patent not validated

Bibliographic data

Indications of the International Patent Classification (IPC)
(51)	INT.CL.	C23C 14/34
		C23C 14/14
		H01L 21/285
		B21B 1/22

European patent
(11)	Number of the document	2878699
(13)	Kind of document	T
(96)	European patent application number	13866236.6
	Date of filing the European patent application	2013-12-06
(97)	Date of publication of the European application	2015-06-03
(45)	Date of publication and mention of the grant of the patent	2020-07-15
(46)	Date of publication of the claims translation

PCT application
(86)	Number	PCT/JP2013/082764
	Date	2013-12-06

PCT application publication
(87)	Number	WO 2014/097897
	Date	2014-06-26

Priority applications
(30)	Number	Date	Country code
	2012276883	2012-12-19	JP

Inventors
(72)	SENDA, Shinichiro, JP NAGATSU, Kotaro, JP

Grantee
(73)	JX Nippon Mining & Metals Corp., 6-3, Otemachi 2-chome, Chiyoda-ku Tokyo 100-8164, JP

Title
(54)	TANTALUM SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
	TANTALUM SPUTTERING TARGET AND METHOD FOR PRODUCING SAME