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Teisinis statusas
Patentas neįsigaliojo (pagal EPK)
| (51) | INT.CL. | C23C 14/34 | |
| C23C 14/14 | |||
| H01L 21/285 | |||
| B21B 1/22 |
| (11) | Patento numeris | 2878699 |
| (13) | Dokumento rūšis | T |
| (96) | Europos patento paraiškos numeris | 13866236.6 |
| Europos patento paraiškos padavimo data | 2013-12-06 | |
| (97) | Europos patento paraiškos paskelbimo data | 2015-06-03 |
| (45) | Paskelbimo apie Europos patento išdavimą data | 2020-07-15 |
| (46) | Apibrėžties vertimo paskelbimo data |
| (86) | Numeris | PCT/JP2013/082764 |
| Data | 2013-12-06 |
| (87) | Numeris | WO 2014/097897 |
| Data | 2014-06-26 |
| (30) | Numeris | Data | Šalis |
| 2012276883 | 2012-12-19 | JP |
| (72) |
SENDA, Shinichiro, JP
NAGATSU, Kotaro, JP
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| (73) |
JX Nippon Mining & Metals Corp.,
6-3, Otemachi 2-chome, Chiyoda-ku Tokyo 100-8164,
JP
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| (54) | TANTALUM SPUTTERING TARGET AND METHOD FOR PRODUCING SAME |
| TANTALUM SPUTTERING TARGET AND METHOD FOR PRODUCING SAME |