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LT - NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM
EN - NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM

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Patent not validated

Bibliographic data
Indications of the International Patent Classification (IPC)
(51) INT.CL. G03F 7/038
G03F 7/004
G03F 7/36
G03F 7/38
G03F 7/40
European patent
(11) Number of the document 3394674
(13) Kind of document T
(96) European patent application number 16815855.8
Date of filing the European patent application 2016-12-20
(97) Date of publication of the European application 2018-10-31
(45) Date of publication and mention of the grant of the patent 2020-05-06
(46) Date of publication of the claims translation
PCT application
(86) Number PCT/EP2016/081903
Date 2016-12-20
PCT application publication
(87) Number WO 2017/108778
Date 2017-06-29
Priority applications
(30) Number Date Country code
201514976498 2015-12-21 US
Inventors
(72)
CHEN, Chunwei, US
LIU, Weihong, US
LU, PingHung, US
Grantee
(73) AZ Electronic Materials Luxembourg S.ą.r.l., 46 Place Guillaume II, 1648 Luxembourg, LU
Title
(54) NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM
  NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM